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其它种类光器件

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相位掩模板

相位掩模板

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Description

相位掩模板其实质上也是一种光栅，光通过相位掩模板爆发衍射，由于其特殊的结构，光的0级衍射被抑制，±1级衍射被增强。±1级的光打在光纤的纤芯上，致使纤芯的折射率爆发改变，形成光栅，从而用于在光纤中刻写光纤光栅。

特点：

0/-1 order Phase mask

Holographically patterned, RIE etched

100% Class 10 cleanroom production

0.01 nm period accuracy and uniformity

Uniform period, or with continuous, linear chirp

订购参数：

参数

规格

相位掩膜板周期

400nm-2150nm

事情波长

193nm-800nm

质料

UV grade fused silica

模板周期的最高精度可达

±0.01nm

周期的匀称性

±0.01nm

啁啾率

0-20nm/cm

模板栅结构尺寸

10mmx10mm

25mmx10mm

50mmx10mm

100mmx10mm

衍射效率

0级衍射≤3%，±1级衍射≥33%

 

 

 

 

 

Important Notice

Performance figures, data and any illustrative material provided in this data sheet are typical and must be specifically confirmed in writing by F-tone Networks before they become applicable to any particular order or contract. In accordance with the F-tone Networks policy of continuous improvement specifications may change without notice.

The publication of information in this data sheet does not imply freedom from patent or other protective rights of F-tone Networks or others. Further details are available from any F-tone Networks sales representative.

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